Schlagwort: J. Appl. Phys.

Impact of field stress pattern on the performance of HfO2-based ferroelectric tunnel junctions

Journal of Applied Physics
10.1063/5.0325206

Diffusion of contact metals in GaN/AlGaN stacks

Journal of Applied Physics
10.1063/5.0316421

Impact of ALD Oxidant and Deposition Temperature on Electrical Characteristics of Al2O3/SiO2/SiC MOS-Capacitors

Materials Science Forum
10.4028/p-0EmUTi