Physical Characterization

NaMLab hosts a dedicated physical characterization toolpark to supplement its core expertise in state-of-the-art material development and electrical characterization. One focus of the physical characterization at NaMLab aims to provide fast-feedback to the technology development in the cleanroom and at research partners.

Contact

Dr. Jens Trommer

Dr. Jens Trommer
Senior Scientist
E-Mail: info[at]namlab.com


surface topography of GaN

The atomic force microscope (AFM) is routinely used for mapping the surface topography by using contact or tapping mode. Resolution in the order of 2 nm in the scanning direction (X/Y) and below 0.1 nm perpendicular to the scanning direction (Z) can be realized, shown at an example of an epitaxial grown GaN surface in Figure. At NamLab a big variety of special measurement technique is used with a great expertise such as scanning Spreading Resistance Microscopy (SSRM) to map the spatial dopant distribution, conductive AFM (C-AFM) for measuring local leak-age current density, piezo force microscopy (PFM) for analyses of piezo-electric materials by measuring the vertical displacement of the AFM tip in response to an electrical excitation of the sample.

A multifunctional X-ray diffractometer (XRD) is used to yield information about crystal structure. The tool has a resolution of < 40 arcsec and is used for phase analysis, measuring reciprocal space maps, determining the composition of alloys, layer thickness and stress state. A high-resolution X-ray diffraction measurement on a AlGaN/ GaN superlattice structure is shown in Figure.

XRD measurement and simulation of GaN superlattice