Our Clean Room
NaMLab boasts a clean room space of over 330 m2, with a classification class 6 for the general working area and class 5 in the photosensitive lithography area. Within this space there is a broad range of equipment for deposition, structuring and characterization of state-of-the-art materials, devices and even higher-level structures.
What we can offer
Our diverse equipment portfolio enables advanced process development across both front-end-of-line (FEOL) and back-end-of-line (BEOL) stages. A highly flexible workflow supports seamless integration of hybrid fabrication schemes, including collaborative projects with partners on platforms handling wafers up to 200 mm in diameter.
Beyond technology development, NaMLab offers expertise in fundamental materials science, driving innovation from the underlying physics and chemistry.