20 Years Ferroelectric Doped HfO2
NaMLab invites to the Novel High-k Application Workshop on March 24th – 26th, 2025. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.
In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO2 and ZrO2 and the application of these films will be discussed followed by the newest results of ferroelectric AlScN.
Event Location: IFW Dresden, Helmholtzstrasse 20, directions
A limited number of parking spaces are available at Namlab – Noethnitzer Strasse 64. Please mention the workshop at the barrier.
Closest accommodations:
2) IBIS
(Occidental Dresden Newa Hotel formerly Pullman Hotel is closed for renovation Jan – March 2026)
Be careful of SPAM emails. We did not contact any travel agencies to get in touch with you.
Confirmed Speakers – March 24/25:
Devices FeRAM
Marcello Mariani, Micron, Italy
Laurent Grenouillet, CEA LETI Grenoble, France
Jan Van Houdt, IMEC, Belgium
Devices FeFET
Johannes Mueller, GlobalFoundries, Dresden, Germany
Sayeef Salahuddin, UC Berkeley, USA
Maximilian Lederer, Fraunhofer IPMS, Dresden, Germany
Ferroelectric Devices
Cheol Seong Hwang, Seoul National University, Korea
Laura Begon-Lours, ETH Zürich, Switzerland
David Esseni, University of Udine, Italy
Stefan Slesazeck, Namlab, Dresden, Germany
Characterization:
Ulrich Boettger, RWTH Aachen, Germany
Alexei Gruverman, Univ. Lincoln-Nebraska, USA
Martina Mueller, University of Konstanz, Germany
Jon Ihlefeld, University of Virginia, USA
Roger Proksch, Oxford Instruments, USA
Epitaxial films
Beatriz Noheda, Univ. Groningen, Netherlands
Hiroshi Funakubo, Science Tokyo, Japan
Florencio Sanchez, ICMAB, Spain
Theory
Jorge Inguenez, LIST, Luxembourg
Alfred Kersch, UAS Munich, Germany
Junghae Choi, KIST, Korea
Wurzite-structured ferroelectrics (March 26th)
Simon Fichtner, Univ. Kiel, Germany
Cheol Seong Hwang, Seoul National University, Korea
Sebastian Siol, EMPA, Switzerland
Marco Deluca, Silicon Austria, Austria
Roberto Guido, Namlab, Germany