20 Years Ferroelectric Doped HfO2
Thank you for coming to the Namlab Novel High-k Application Workshop on March 24th – 26th, 2025. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics were discussed by more than 100 participants from industry, research institutes and universities.
In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO2 and ZrO2 and the application of these films will be discussed followed by the newest results of ferroelectric AlScN. This year, the workshop has a special focus on the 20th anniversary of the discovery of the ferroelectric properties of doped HfO2.
Workshop Registration: please use the following Eventfrog link
Registration:
Fee: 55 €/workshop day includes all meals and coffee breaks.
Early Bird deadline: End of February ’26
In addition, we will have a conference dinner buffet in the
Bilderberg Bellevue Hotel on March 24th at 7:00pm.
.
Event Location:
IFW Dresden, Helmholtzstrasse 20, directions
Fifteen parking spaces are available across Noethnitzer Strasse. Please mention the „High-k Workshop“ at the barrier.
Closest accommodations:
1) IntercityHotel Dresden – special accommodation rate – keyword ‚Namlab‘ – see hotel link
4) Holiday Inn Express Prager Strasse
(Occidental Dresden Newa Hotel formerly Pullman Hotel is closed for renovation during the workshop)
Be careful of SPAM emails. We did not contact any travel agencies to get in touch with you.
.

.
Preliminary Agenda













