Kategorie: Events

20 Years Ferroelectric Doped HfO₂

NaMLab invites to the Novel High-k Application Workshop on March 24th – 26th, 2025. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.

In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO₂ and ZrO₂ and the application of these films will be discussed followed by the newest results of ferroelectric AlScN.

Event Location: IFW Dresden, Helmholtzstrasse 20, directions

A limited number of parking spaces are available at Namlab – Noethnitzer Strasse 64. Please mention the workshop at the barrier.

Closest accommodations:

1) Occidental Dresden Newa Hotel (formerly Pullman Hotel)

2) IBIS

3) Intercity Hotel

Be careful of SPAM emails. We did not contact any travel agencies to get in touch with you.

Confirmed Speakers:

Devices

Cheol Seong Hwang, Seoul National University, Korea

Laurent Grenouillet, CEA LETI Grenoble, France

Johannes Mueller, GlobalFoundries, Dresden, Germany

Sayeef Salahuddin, UC Berkeley, USA

Laura Begon-Lours, ETH Zürich, Switzerland

Jan Van Houdt, IMEC, Belgium

Characterization:

Ulrich Boettger, RWTH Aachen, Germany

Alexei Gruverman, Univ. Lincoln-Nebraska, USA

Martina Mueller, University of Konstanz, Germany

Jon Ihlefeld, University of Virginia, USA

Epitaxial films

Beatriz Noheda, Univ. Groningen, Netherlands

Florencio Sanchez, ICMAB, Spain

Theory

Jorge Inguenez, LIST, Luxembourg

Alfred Kersch, UAS Munich, Germany

Junghae Choi, KIST, Korea

Wurzite-structured ferroelectrics (March 26^th)

Simon Fichtner, Univ. Kiel, Germany

Cheol Seong Hwang, Seoul National University, Korea

Sebastian Siol, EMPA, Switzerland

Roberto Guido, Namlab, Germany

Marco Deluca, Silicon Austria, Austria

Chip design is one essential step in designing microelectronics for specific products and applications. Expertise in chip design can strengthen Germany’s innovation and competitiveness and increase its technological sovereignty in Europe. In order to leverage this potential, the German Ministry for Education and Research (BMBF) has launched the Microelectronics Design Initiative with four key areas of focus: a strong network as a central exchange platform, training and further education for talented individuals and specialists, research projects to strengthen design capabilities and the expansion of research structures.

As a part of the Design-Initiative NaMLab is currently coordinating the multi-partner research project called DI-ReDesign which aims at developing open-source design tools and logic libraries for chip design with emerging #reconfigurable field effect transistors (RFETs). The special properties of RFETs enable flexible applications in digital and analog circuits, from signal processing and neural networks to low-temperature electronics. The open design library and tool chain will enable highly innovative circuit designs in the future – both functionally and from a security perspective. The project is running since 05/2024 and will continue to 04/2027.

The concept and innovations behind Re-Design will be presented by Dr. Jens Trommer at the Chipdesign Germany Forum 2025 on May 13 in Messe Dresden. Find out more about the event program here: https://www.chipdesign-germany.de/de/events/2025/dresden-chipdesign-germany-forum/

NaMLab invites to the Novel High-k Application Workshop on March 12th and 13th, 2025. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.

In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO₂ and ZrO₂ and the application of these films will be discussed.

Workshop Registration: please use the following Eventfrog link.

Registration fee: 55 €/workshop day includes all meals and coffee breaks.

In addition, we will have a conference dinner buffet in the Occidental Hotel on March 12^th at 7:30pm.

Event Location: IFW Dresden, Helmholtzstrasse 20, directions

A limited number of parking spaces are available at Namlab – Noethnitzer Strasse 64. Please mention the workshop at the barrier.

Closest accommodations:

1) Occidental Dresden Newa Hotel (formerly Pullman Hotel)

2) IBIS

3) Intercity Hotel

Agenda

Sponsor:

Ever wondered what makes your gadgets work and how its done? Here is your chance to grab the opportunity to experience how cutting-edge semiconductor research happens.

At NaMLab, we dive deep into semiconductor science, from nanofabrication to advanced material research, contributing to shape the exciting and challenging world of micro- and nanoelectronics.

On the occasion of Girls Day 2025, we are happy to welcome you and explore our research, centering on the theme of

“Think Big – Make Nano”

We offer an introduction to what we do at Namlab and how microelectronics is relevant for us. To keep the day engaging, experimental demonstrations featuring fabrication techniques, physical and electrical characterization are planned.

If you are excited to know more about what to expect on the day, be sure to watch our YouTube video.

If you want to take part, we look forward to your registration here!

NaMLab invites to the Novel High-k Application Workshop on March 11th and 12th, 2024. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.

In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO₂ and ZrO₂ and the application of these films will be discussed.

Workshop Registration: please use the following Eventfrog link.

Registration fee: 55€/workshop day includes all meals and coffee breaks. (The ticketing webpage should adjust to your local language. If not, change /de to /en or /fr or /it).

In addition, we will have a conference dinner buffet in the Pullman Hotel on March 11^th at 7:30pm.

Event Location: IFW Dresden, Helmholtzstrasse 20, directions

Parking at IFW – please mention ‚Namlab workshop‘

Closest accommodations:

1) Pullman Dresden Newa Hotel

2) IBIS

3) Intercity Hotel

Oxford Instruments AFM Workshop

For your travel planning: Oxford Instruments is organizing a Workshop on Vero Interferometric AFM on March 13^th.

Preliminary agenda – confirmed talks (20 min talk + 5 min discussion)

Sponsored by

NaMLab invites to the Novel High-k Application Workshop on May 10th and 11th, 2023. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.

In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO₂ and ZrO₂ and the application of these films will be discussed.

Event Location: IFW Dresden, Helmholtzstrasse 20

Workshop registration: please follow the Eventfrog link

Registration fee: 49€/workshop day includes all meals and coffee breaks. (The ticketing webpage should adjust to your local language. If not, change /de to /en or /fr or /it).

In addition, we will have a conference dinner in the restaurant ‘Italienisches Dörfchen’ on May 10^th at 7:30pm.

For better planning, please register until end of April and decide on the food options (meat/fish/vegan (vegetarian)).

After May 7th, the dinner can no longer be booked.

Closest accommodations:

1) Pullman Dresden Newa Hotel

2) IBIS https://www.ibis-dresden.de/en/

3) Intercity Hotel https://hrewards.com/de/intercityhotel-dresden

Agenda (20 min talk + 5 min discussion)

Further details: Directions to IFW and Dinner Restaurant.

The High k Workshop at Namlab workshop is now open for registration.

Please use the following link to register*: https://en.xing-events.com/LKKYWNO

Similar to the last years, you can register for September 12^th and 13^th separately.

The registration fee of 40€/day will cover coffee breaks and lunch.

In addition, we will have a conference dinner on September 12^th sponsored by Oxford Instruments.

Workshop location:

TU Dresden, Computer Sciences, Noethnitzer Str. 46: https://tu-dresden.de/ing/informatik

Workshop dates:

September 12^th and 13^th – 9 am to 6 pm

Closest accommodations:

1) Pullman Dresden Newa Hotel https://www.pullman-hotel-dresden.de

2) IBIS https://www.ibis-dresden.de/en/

3) Intercity Hotel https://hrewards.com/de/intercityhotel-dresden

Preliminary Agenda (20 min talk + 5 min discussion)

Sponsor: Oxford Instruments

See also: Oxford/Namlab workshop on September 14^th and 15^th:

DRY PROCESSING WORKSHOP: DEPOSITION & ETCHING

Due to the current situation, the ‚Novel High k Application Workshop‘ at Namlab is planned as a combination of:

• a virtual seminar series in April/May 2022 and

• an on-site event in September 2022.

The virtual seminar will take place every week on a Friday at 2 pm Dresden time from April 29, 2022 until the end of May 2022. The presentations can be followed as a live Zoom event including a Q+A session directly after each talk. Registration for this event will be announced soon. Speakers including members of their research groups are automatically registered.

Speakers of both Namlab workshops including members of their research groups are automatically registered. All other interested parties please register via the following website: https://www.xing-events.com/XUBXQWP.html

Preliminary agenda for the virtual seminar:

This year, we celebrate 15 years of the discovery of ferroelectricity in doped HfO₂ films and the tenth anniversary of the first publication announcing ferroelectricity in Applied Physics Letters by Tim Boescke.

Due to the current situation, the ‚Novel High k Application Workshop‘ at Namlab is planned as a virtual seminar series. The seminar will take place every week on a Friday at 2 pm Dresden time from April 23, 2021 until the end of May 2021. The presentations can be followed as a live Zoom event including a Q+A session directly after each talk. A preliminary agenda can be found below.

Registration for this event: https://www.xing-events.com/WTSWMRD

Speakers including members of their research groups are automatically registered.

.

This event is sponsored by the 3eFerro project through the European Union’s Horizon 2020 research and innovation programme.

Due to the current Corona virus situation Namlab decided to cancel the workshop.

A lot of speakers are not allowed to travel anymore or would need to be quarantined after coming back from Dresden. Workshop fees will be reimbursed through XING.

We will not postpone the workshop as it is not clear how long the current situation will last.

Conference proceedings would be still available:

Ferroelectric HfO₂ results can be published in a Appl. Phys. Letter Special Topic collection.
Guest editors: T. Mikolajick, M.H. Park, U.Schroeder (details will follow)

Thank you for our understanding.

NaMLab invited to the Novel High-k Application Workshop on June 11th and 12th, 2019. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics were discussed by more than 100 participants from industry, research institutes and universities. Thank you for coming to Dresden.