Novel High k Application Workshop

Since 2010, NaMLab has hosted the Novel High-k Application Workshop every year. The workshop brings together more than 100 participants from industry, research institutes, and universities to discuss new challenges offered by the application of high-k dielectric materials in micro- and nanoelectronics.

Through this series of workshops, NaMLab has established a platform where application-oriented scientists can exchange ideas and discuss recent experimental results regarding devices, process technology, reliability, and the characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. In recent years, discussions have focused on the formation of ferroelectric properties in fluorite (doped HfO₂, doped ZrO₂) and wurtzite (e.g., AlScN) structured ferroelectrics, as well as the application of these films.

The following presentations were given::

2010