The next Namlab Novel High-k Application Workshop is planned for March 3 – 5, 2027. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics will be discussed by more than 100 participants from industry, research institutes and universities.
In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO2 and ZrO2 and the application of these films will be discussed followed by the newest results of ferroelectric AlScN. This year, the workshop has an additional special focus on the ‚Reconfigurable Devices‘
Workshop Registration will start in January 2027
Event Location:
IFW Dresden, Helmholtzstrasse 20, directions
Fifteen parking spaces are available across Noethnitzer Strasse. Please mention the „High-k Workshop“ at the barrier.
Closest accommodations:
1) IntercityHotel Dresden
4) Holiday Inn Express Prager Strasse
5) Barceló Dresden Newa Hotel (formerly Pullman Newa)
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